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 | NEXIV VMR-12072
Ladda ner pdf (Öppnas i nytt fönster) | 47-inch display device measurement platform with ultra-long 1200x720mm stage.
Largest stage stroke provides maximum size, speed and performance in the measurement of very large-size workpieces such as FPD devices.
The largest of the NEXIV Non-contact automated measuring instruments, the VMR-12072 can handle large flat panels, shadow masks, etching sheets for lead frames, LCDs, mask patterns, and other extra large workpieces. Among its many features is a 1200x720x150mm stroke, bright diascopic illumination, pinpoint laser autofocusing, and advanced search functions. An ultra-high magnification model is also available.
Key features
• Ultra-long stage
• Pinpoint laser autofocusing
• Advanced search functions
Applications
• Surface analysis
• Liquid crystal displays
Functionalities
Type 1,2,3 models
• 1200x720mm stage travel is more than adequate to handle large flat panels, shadow masks, etching sheets for lead frames, LCDs, mask patterns, and other large work-pieces; 150mm Z-axis stroke; bright diascopic illumination
• 3 models (type: 1, 2, 3) with 5-step zoom magnification to cover different fields of view and resolution requirements
• Laser AF also enables measurements of height variance and warping in workpieces
• Search function facilitates measurements of lands and holes of PCBs
• Variety of illumination choices facilitate accurate edge detection even for vague geometries
• High-speed stage and high-speed image processing provide high throughput
Z120X model (maximum magnification module)
• Achieves ultra-high magnification measurements with a long 1200x720mm stage stroke. Ideal for measuring minute line widths of large-size display panels.
• Automatic measurements of batches of small parts
• Laser AF achieves high-accuracy measurements of bump heights Laser AF enables measurements of height variance and warping in workpieces
• Search function enables measurements of lands and holes of PCBs
• Search function also provides accurate measurements even when workpieces are not located properly on the stage
• Variety of illumination choices facilitate accurate edge detection even for weak edges
• High-speed stage and image processing provide higher throughput
• Ideal for LCD glass substrates (pattern measurements) and organic EL glass substrates (pattern measurements)
LU model (universal epi-illuminator/motorized nosepiece)
• Full range of Nikon CFI60 LU microscope objectives from 5X to 150X
• Supports brightfield, darkfield, DIC, simple polarizing applications
• Motorized quintuple universal nosepiece
• Easy to use software controls all functions of the system
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